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Development mechanism study by dissolution monitoring of positive methacrylate photoresists

机译:通过正甲基丙烯酸酯光刻胶溶解监测的显影机理研究

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摘要

The development mechanisms of two polymethacryalte non-chemically amplified resists are investigated and compared using dissolution-monitoring experiments and simulation. The first of these two resists in PMMA and the second an experimental Hydroxyl functioanlised Poly Methacrylate Positive resist (HPMAP). The imaging chemistries of the tow resists are closely related, but different dissolution mechanisms are revealed with this study. Swelling phenomena are encountered in the hydroxyl functionalism material, although an aqueous base developer is used in this case
机译:研究了两种聚甲基丙烯酸铝非化学放大抗蚀剂的显影机理,并通过溶出监测实验和模拟进行了比较。在PMMA中,这两种抗蚀剂中的第一种是抗蚀剂,第二种是实验性的羟基功能化聚甲基丙烯酸酯正性抗蚀剂(HPMAP)。拖曳抗蚀剂的成像化学密切相关,但这项研究揭示了不同的溶解机理。尽管在这种情况下使用了碱性水溶液显影剂,但是在羟基官能团材料中会遇到溶胀现象。

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