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The Influence of Substrate Polarity on the Blue Emission from As-doped GaN Layers Grown by Molecular Beam Epitaxy

机译:基谱极性对分子束外延生长的掺杂GaN层蓝发射的影响

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The influence of sample orientation and polarity on the blue emission from As-doped GaN layers grown by plasma-assisted molecular beam epitaxy (PA-MBE) was investigated. Arsenic doped GaN layers were grown under identical PA-MBE conditions on several types of substrates including c-plane (0001) sapphire and polar and non-polar GaN templates grown by metal-organic vapour phase epitaxy (MOVPE). Non-polar GaN MOVPE templates were grown on a-plane (11-20) sapphire and LiAlO_2 (100). The orientation and polarity have a strong influence on the morphology and the optical properties of As-doped GaN layers. Strong blue emission from As-doped GaN was observed only in the case of (000-1) oriented N-polarity layers.
机译:研究了样品取向和极性对由等离子体辅助分子束外延(PA-MBE)生长的掺杂GaN层的蓝色发射的影响。在包括由金属 - 有机气相外延(MOVPE)生长的C面(0001)蓝宝石和极性和非极性GaN模板的若干类型的基材上,在相同的PA-MBE条件下生长砷掺杂GaN层。非极性GaN Movpe模板在一架飞机上(11-20)蓝宝石和Lialo_2(100)种植。取向和极性对掺杂GaN层的形态和光学性质产生了强烈影响。仅在(000-1)取向的N极性层的情况下仅观察到来自掺杂GaN的强大发射。

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