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Exciton emission of quasi-2D InGaN in GaN matrix grown by molecular beam epitaxy

机译:分子束外延生长GaN基体中准2D InGaN的激子发射

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摘要

We investigate the emission from confined excitons in the structure of a single-monolayer-thick quasi-two-dimensional (quasi-2D) InxGa1−xN layer inserted in GaN matrix. This quasi-2D InGaN layer was successfully achieved by molecular beam epitaxy (MBE), and an excellent in-plane uniformity in this layer was confirmed by cathodoluminescence mapping study. The carrier dynamics have also been investigated by time-resolved and excitation-power-dependent photoluminescence, proving that the recombination occurs via confined excitons within the ultrathin quasi-2D InGaN layer even at high temperature up to ~220 K due to the enhanced exciton binding energy. This work indicates that such structure affords an interesting opportunity for developing high-performance photonic devices.
机译:我们研究了插入GaN矩阵中的单层厚准二维(准2D)InxGa1-xN层的结构中受限激子的发射。该准二维InGaN层是通过分子束外延(MBE)成功实现的,并且该层的出色的面内均匀性已通过阴极发光映射研究得到了证实。还通过时间分辨和激发功率相关的光致发光研究了载流子动力学,证明了由于增强的激子结合,即使在高达约220 K的高温下,超薄准2D InGaN层中的受限激子也能发生重组。能源。这项工作表明,这种结构为开发高性能光子器件提供了有趣的机会。

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