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Stability in electrical properties of ultra thin tin oxide films

机译:超薄锡氧化膜电性能的稳定性

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Tin Oxide films of less than 30nm in thickness were developed as transparent conductive electrodes. The films were deposited onto glass substrates by APCVD. Fluorine was used as a doping component. Stability to heat treatments in air at more than 500· was studied. Carrier concentration decreased and Hall mobility increased by the heat treatments. It was found relations between carrier concentration and mobility exhibited an exponential relation in extremely low fluorine concentration films. The exponent of the relation was close to -1.5. Resistivity decreased for the films, while it increased for films with high fluorine concentration. It was also found migration of sodium from the substrates into the films increased with increase of fluorine concentration in the films. Results suggest the sodium migration would affect grain growth and electrical properties of the films.
机译:厚度小于30nm的氧化锡膜作为透明导电电极。通过APCVD将薄膜沉积在玻璃基质上。氟作为掺杂组分。研究了在500·的空气中加热处理的稳定性。载体浓度降低,并且通过热处理增加了霍尔迁移率。结果发现载体浓度和迁移率之间的关系在极低的氟浓度薄膜中表现出指数关系。关系的指数接近-1.5。对于薄膜的电阻率降低,而氟浓度高的薄膜增加。还发现,随着薄膜中的氟浓度的增加,还发现从基板的迁移到薄膜中。结果表明碘化钠会影响薄膜的晶粒生长和电气性质。

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