机译:通过涂覆超薄非晶ITO膜作为阻挡层,非晶IGZO膜具有高的热稳定性,电学和光学特性
School of Materials Science and Engineering, Central South University, Changsha 410083, People's Republic of China;
School of Materials Science and Engineering, Central South University, Changsha 410083, People's Republic of China,Guangxi Key Laboratory of Information Materials, Guilin University of Electronic Technology, Guilin 541004, People's Republic of China;
College of Optoelectronic Engineering, Chongqing University, Chongqing 400044, People's Republic of China;
School of Materials Science and Engineering, Central South University, Changsha 410083, People's Republic of China;
School of Materials Science and Engineering, Central South University, Changsha 410083, People's Republic of China;
机译:控制通过脉冲激光沉积制备的非晶IGZO薄膜的电学和光学性质
机译:具有超薄沟道层的非晶IGZO薄膜晶体管
机译:氧/氩反应气体比例对HiPIMS工艺涂覆非晶IGZO薄膜光学和电学特性的影响
机译:热CVD法掺杂碘的非晶碳薄膜的电学和光学性质
机译:超导体-绝缘体过渡附近超薄非晶态铋薄膜的电输运性质
机译:组成对非晶GaxSe100-x纳米棒薄膜电学和光学性能的影响
机译:Cu缓冲层对IGZO / Cu双层膜的结构,光学和电性能的影响
机译:用作扩散阻挡层的非晶态Ni-Nb薄膜的热稳定性