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首页> 外文期刊>Journal of the Korean Physical Society >Controlling the Electrical and the Optical Properties of Amorphous IGZO Films Prepared by Using Pulsed Laser Deposition
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Controlling the Electrical and the Optical Properties of Amorphous IGZO Films Prepared by Using Pulsed Laser Deposition

机译:控制通过脉冲激光沉积制备的非晶IGZO薄膜的电学和光学性质

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We have investigated the effects of substrate temperature and oxygen pressure on the electrical and the optical properties of amorphous InGaZnO4 (a-IGZO) films grown on glass substrates by using pulsed laser deposition. X-ray diffraction and scanning electron microscopy data suggest that the a-IGZO starts to crystallize around ~600℃. The electrical resistivity and the carrier density of the a-IGZO film showed large variations with changes in the substrate temperature or the oxygen pressure. The resistivity of the a-IGZO film was minimized at ~200℃ and ~10 mTorr. The energy gap estimated from the optical transmittance showed an increasing tendency with increasing of substrate temperature up to ~200℃ or with increasing of oxygen pressure up to 100 mTorr, and it was about ~3.0 eV at 200℃ and 10 mTorr. Remarkably, the optical transmittance for the a-IGZO film showed a clear variation in the violet color region with changing of the substrate temperature and oxygen pressure. Our results suggest that both the substrate temperature and the oxygen pressure can be exploited as key parameters to control the electrical and the optical properties of a-IGZO films.
机译:我们已经研究了基板温度和氧气压力对使用脉冲激光沉积在玻璃基板上生长的非晶InGaZnO4(a-IGZO)薄膜的电学和光学特性的影响。 X射线衍射和扫描电子显微镜数据表明,a-IGZO在〜600℃左右开始结晶。 a-IGZO膜的电阻率和载流子密度随着基板温度或氧气压力的变化而显示出较大的变化。在〜200℃和〜10mTorr下,a-IGZO膜的电阻率最小。由光透射率估算的能隙随着衬底温度升高至约200℃或随着氧气压力升高至100 mTorr而呈增加趋势,在200℃和10 mTorr时约为3.0 eV。值得注意的是,随着衬底温度和氧气压力的变化,a-IGZO膜的透光率在紫色区域显示出明显的变化。我们的结果表明,衬底温度和氧气压力都可以用作控制a-IGZO薄膜的电学和光学特性的关键参数。

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