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LPCVD of Optical Interference Coatings for Micro-Optical Applications

机译:用于微光学应用的光学干涉涂层的LPCVD

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The rapid explosion of growth of the Internet has created a demand for increased bandwidth. All optical networks are becoming important in filling this bandwidth gap. Optical interference filters are enabling technologies that provide management of light in optical switching, multiplexing, demultiplexing and transmission of optical signals. Low Pressure Chemical Vapor Deposition (LPCVD) is a deposition technique uniquely qualified to provide uniform durable optical interference coatings on fiber optic components of complex shapes where the size of components ranges from 200 microns to 6 mm.
机译:互联网增长的快速爆炸已经为带宽增加了需求。所有光网络在填充这种带宽间隙方面都变得重要。光学干扰滤波器是实现光学切换,多路复用,解复用和光信号传输中光的管理的技术。低压化学气相沉积(LPCVD)是唯一合格的沉积技术,用于在复杂形状的光纤部件上提供均匀的耐用光学干涉涂层,其中部件的尺寸范围为200微米至6mm。

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