LPCVD of Optical Interference Coatings for Micro-Optical Applications

摘要

Deposition of uniform, durable optical coatings on non-planar lens surfaces such as spheres, hemispheres, and concave/ convex cylindrical lenses is problematic by traditional evaporative or sputtering thin film deposition techniques. To achieve uniformity over such surfaces by these traditional methods requires special screening and/or rotation schemes. This is exceptionally difficult in fiber optic applications such as optical telecommunications and endoscope equipment where the size of components ranges from 200 microns to 6 mm. Low Pressure Chemical Vapor Deposition (LPCVD) is a deposition technique uniquely qualified to provide uniform durable Optical Interference coatings on these components. The proper choice of chemical precursors, reactor temperature and process conditions has led to the development of a manufacturing process for anti-reflectance (AR) coatings, UV filters, hot mirrors and cold mirrors on optical components used in telecommunications, fiber optic lighting and endoscope applications. The LPCVD thin film coating process provides high performance optical films on complex shapes with the superior durability required for these applications. This paper discusses LPCVD process development, process yield and results for various optical thin film coatings.