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Influence of boron ion implantation of the mechanical properties of TiN coatings deposited by cathodic ARC evaporation

机译:通过阴极弧蒸发沉积锡涂层力学性能的硼离子植入的影响

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TiN coatings were deposited on SUS420J2 steel substrates by cathodic arc evaporation. Boron ions were implanted into TiN coatings at 75keV with a dose range of 1.0~8.0*10~(17) ions cm~(-2). The composition and crystallographic structure of as-deposited and implanted TiN coatings were characterized by X-ray photoelectron spectroscopy and Glancing-angle X-ray diffraction. Ball-on-disc wear tests were carried out to evaluate wear resistance of asdeposited and implanted TiN coatings. The results of wear tests showed that boron ion implantation resulted in a significant improvement in the wear resistance of TiN coatings.
机译:通过阴极电弧蒸发在SUS420J2钢基板上沉积锡涂层。将硼离子植入75KeV的锡涂层中,剂量范围为1.0〜8.0〜10〜(17)离子Cm〜(-2)。通过X射线光电子能谱和透明角X射线衍射的组成和植入锡涂层的组成和晶体结构的特征在于。进行圆盘磨损试验,以评估嵌入和植入锡涂层的耐磨性。磨损试验结果表明,硼离子注入导致锡涂层的耐磨性显着改善。

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