首页> 外文会议>International conference on application of accelerators in research and industry >Oxide film deposition by gas-cluster ion assisted deposition
【24h】

Oxide film deposition by gas-cluster ion assisted deposition

机译:通过气体聚类离子辅助沉积氧化膜沉积

获取原文

摘要

The development of ultra-high quanity (UHQ) films is in progress under the NEDO projects*. This project is acollaboration between several companies, national laboratories and universities. A Multi-Beam Gas-Cluster IOn Beam System has been developed for fabricating indium tin oxide (ITO) films. The concept of a multi-beam deposition technique, the description of the MUlti-Beam GSas Cluster IOn Beam System as well as our current progress on this project are presented.
机译:在NEDO项目下,超高夸氏(UHQ)电影的发展在进展*。该项目在几家公司,国家实验室和大学之间进行了侵入。已经开发了一种用于制造铟锡(ITO)膜的多光束气体聚类离子束系统。多光束沉积技术的概念,提供了多光束GSAS聚类离子束系统的描述以及我们对该项目的当前进度。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号