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Experimental Evaluation of Second Harmonic Generation for Non-Invasive Contamination Detection in SOI Wafers

机译:SOI晶片中非侵入性污染检测二次谐波产生的实验评价

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We report experimental results from non-invasive second harmonic generation (SHG) measurements applied to detect the presence of contamination at the silicon/buried oxide (BOX) and BOX/substrate interfaces in silicon-on-insulator (SOI) wafers. The potential application of SHG as a metrology tool for process control is demonstrated.
机译:我们报告了应用于检测硅/掩埋氧化物(盒子)的污染物的污染和绝缘体上的硅/掩埋氧化物(SOI)晶片中的盒/基板界面的实验结果。证明了SHG作为过程控制的计量工具的潜在应用。

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