首页> 外文会议>Annual Pan Pacific microelectronics symposium >Photosensitive Dielectric Film for build-Up Circuit Boards
【24h】

Photosensitive Dielectric Film for build-Up Circuit Boards

机译:用于堆积电路板的光敏介电膜

获取原文

摘要

We have developed a new photosensitive dielectric material, PAID (Photosensitive Acryl-Imide Dielectric), for build-up circuit boards. The varnish of PAID consists of a non-photosensitive polyimide precursor, acrylic monomers, a photoinitiator, and additives. PAID film can be cured at 200 deg C, therefore an organic substrate can be used as a substrate for build-up circuit boards. This paper describes some technical advantages of PAID, which is cured at 200 deg C, in comparison with general photosensitive epoxy and general photosensitive polyimide.
机译:我们开发了一种新的光敏介电材料,用于积聚电路板(用于积聚光敏丙烯酸酰亚胺电介质)。支付的清漆包括非光敏聚酰亚胺前体,丙烯酸单体,光引发剂和添加剂。支付膜可以在200℃下固化,因此有机基质可以用作积聚电路板的基板。本文介绍了支付的一些技术优势,与一般光敏环氧树脂和一般光敏聚酰亚胺相比,在200℃下固化。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号