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Photosensitive Dielectric Film for build-Up Circuit Boards

机译:用于组合电路板的光敏介电膜

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We have developed a new photosensitive dielectric material, PAID (Photosensitive Acryl-Imide Dielectric), for build-up circuit boards. The varnish of PAID consists of a non-photosensitive polyimide precursor, acrylic monomers, a photoinitiator, and additives. PAID film can be cured at 200 deg C, therefore an organic substrate can be used as a substrate for build-up circuit boards. This paper describes some technical advantages of PAID, which is cured at 200 deg C, in comparison with general photosensitive epoxy and general photosensitive polyimide.
机译:我们已经开发了一种新的光敏介电材料PAID(光敏丙烯酰亚胺电介质),用于组装电路板。 PAID的清漆由非光敏聚酰亚胺前体,丙烯酸类单体,光引发剂和添加剂组成。 PAID膜可在200摄氏度下固化,因此有机基板可用作积层电路板的基板。与普通的光敏环氧树脂和普通的光敏聚酰亚胺相比,本文介绍了在200℃固化的PAID的一些技术优势。

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