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A Robust Broadband Calibration Method for Wafer-Level Characterization of Multiport Devices

机译:多端口设备晶圆级别表征的鲁棒宽带校准方法

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This paper describes the theory and practical results of the new multiport calibration procedure especially suited for wafer-level device characterization over a wide frequency range. An analysis of the currently available multiport calibration approaches was carried out. The advantages and drawbacks of each approach are demonstrated. It is shown that a robust wafer-level multiport calibration procedure should combine the strengths of both 7-term and 10-term based algorithms. It should also provide reference-match measurements on each VNA measurement port and be insensitive to the behavior of highly-reflective standards and the design of transmission standards. Corresponding to these requirements, the definition of the advanced multiport RRMT+ algorithm is given. The results of a practical experiment proved the theory and demonstrated the advantages of the new multiport RRMT+ calibration procedure.
机译:本文介绍了新的多端口校准程序的理论和实际结果,特别适用于宽频频率范围内的晶片级设备表征。进行了对目前可用的多端口校准方法的分析。对每个方法的优点和缺点进行说明。结果表明,稳健的晶片级多端口校准程序应结合7术语和基于10级算法的强度。它还应该在每个VNA测量端口提供参考匹配测量,对高反光标准的行为和传输标准的设计不敏感。对应于这些要求,给出了高级多端口RRMT +算法的定义。实际实验结果证明了该理论,并证明了新的多端口RRMT +校准程序的优势。

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