首页> 外文期刊>Microwave Theory and Techniques, IEEE Transactions on >Accuracy Improvement for Line-Series-Shunt Calibration in Broadband Scattering-Parameter Measurements With Applications of On-Wafer Device Characterization
【24h】

Accuracy Improvement for Line-Series-Shunt Calibration in Broadband Scattering-Parameter Measurements With Applications of On-Wafer Device Characterization

机译:晶片上器件表征应用在宽带散射参数测量中线串联并联校准的精度提高

获取原文
获取原文并翻译 | 示例
           

摘要

In this paper, error analysis and accuracy improvement for on-wafer line-series-shunt calibration in broadband scattering parameter ($S$-parameter) measurements are presented with complete modeling of the resistive series/shunt standards, rather than the simple lumped assumptions that were basic requirements in previous studies. The associated parasitic effects in the models are estimated by the first-run results using lumped assumption. They are further updated iteratively, where higher order errors are analytically identified. Additionally, the de-embedded $S$ -parameters are transformed for the reference impedance, based on the acquired characteristic impedance, which may differ from the measurement system in broadband operations. The proposed algorithm and calibration data are demonstrated by pseudomorphic high electron-mobility transistors with conductor-back coplanar waveguides built on GaAs substrates with verifications of the thru-reflect-line calibration results.
机译:在本文中,提出了在宽带散射参数($ S $-参数)测量中进行晶圆上线串联分流校准的误差分析和精度的提高,而不是简单地对集总电阻系列/分流标准进行了建模这是先前研究的基本要求。使用集总假设,通过首次运行结果估算模型中的相关寄生效应。它们会以迭代方式进一步更新,从而可以分析出更高阶的错误。另外,基于获取的特征阻抗,将去嵌入的$ S $参数转换为参考阻抗,这可能与宽带操作中的测量系统有所不同。拟议的高电子迁移率晶体管通过在GaAs衬底上构建的带导体背共面波导的伪形高电子迁移率晶体管进行了演示,并通过了反射反射线校准结果的验证。

著录项

相似文献

  • 外文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号