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Trap-mediated, site-selective excitation of photoluminescence from multiple Er/sup 3+/ sites in Er-implanted GaN

机译:陷阱介导的,从eR-incormanted GaN中的多个ER / SUP 3 + /位点的光致发光的位点选择性激发

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Site-selective photoluminescence (PL) and photoluminescence excitation (PLE) spectroscopy have been carried out at 6 K on the /spl sim/1540 nm /sup 4/I/sub 13/2//spl rarr//sup 4/I/sub 15/2/ emissions of Er/sup 3+/ in Er-implanted MOCVD GaN. The PLE spectroscopy has detected several independent, site-selective excitation mechanisms which demonstrate the existence of four different Er/sup 3+/ sites in Er-implanted GaN. Each of these four Er/sup 3+/ sites exhibits a distinctive PL spectrum characteristic of that center's environment when pumped by the appropriate wavelengths of below-gap light. Two of the site-selective Er/sup 3+/ PL spectra pumped by trap-mediated excitation bands dominate the Er/sup 3+/ PL spectrum excited by above-gap light. The PLE spectra demonstrate that the Er/sup 3+/ PL spectra are excited by below gap absorption attributable to both implantation damage-induced defects and defects and impurities characteristic of the as-grown GaN. The temperature dependence of the Er/sup 3+/ PL spectra was studied to examine thermal quenching properties of these site-specific Er/sup 3+/ PL centers.
机译:在/ SPL SIM / 1540nm / sp 4 / i / sub 13 / spl // sup 4 / i / spl rar / spl / spr r / sp 4 / i /上,在6kk上以6k进行,在6k中进行了位点选择性光致发光(PL)和光致发光激发(PLE)光谱。 Sub 15/2 / ER / SUP 3 + /在ER植入的MOCVD GaN中排放。 PLE光谱检测到几种独立的位点选择性激发机制,其证明了ER植入GaN中的四种不同ER / SUP 3 + /位点的存在。这四个ER / SUP 3 + /位点中的每一个都表现出该中心环境的独特PL光谱特性,当通过低于间隙光的适当波长泵送时的环境。由陷阱介导的激励带泵浦的两个站点选择ER / SUP 3 + / PL光谱占据了通过上间隙光激发的ER / SUP 3 + / PL光谱。 PLE光谱表明,ER / SUP 3 + / PL光谱通过以下植入损伤诱导的缺陷和缺陷特征和生长GaN的缺陷和杂质和杂质特征来激发。研究了ER / SUP 3 + / PL光谱的温度依赖性,以检查这些位点特异性ER / SUP 3 + / PL中心的热猝灭性能。

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