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An Optimized Process and Characterization of Pb(Zr,Ti)O_3 Ferroelectric Capacitor for 1T/1C Ferroelectric RAM

机译:用于1T / 1C铁电RAM的PB(ZR,TI)O_3铁电电容器的优化工艺和表征

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An optimized process of Pb(Zr,Ti)O_3(PZT) ferroelectric capacitor has been investigated in order to develop a highly scaleable 1T/1C ferroelectric random access memory. The PZT ferroelectric capacitor, Pt/PZT/Pt stack, was formed on the TiO_2/SiO_2/Si substrate. The PZT thin films were prepared by conventional sol-gel multi-coating method. Physical and electrical properties of the PZT ferroelectric capacitors were characterized by XRD, SEM, TEM and RT6000S, respectively.
机译:已经研究了PB(Zr,Ti)O_3(PZT)铁电电容器的优化过程,以便开发高度可扩展的1T / 1C铁电随机存取存储器。在TiO_2 / SiO_2 / Si衬底上形成PT / PZT / Pt堆的PT / PZT / PT堆。通过常规的溶胶 - 凝胶多涂层方法制备PZT薄膜。 PZT铁电电容器的物理和电性能分别以XRD,SEM,TEM和RT00s为特征。

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