首页> 外文会议>NATO advanced research workshop on international heterostructure epitaxy and devices >OPTICAL GAIN IMPROVEMENT OF GaAs LATERAL PHOTORESISTIVE ELEMENTS BY SULPHUR PASSIVATION OF THE SURFACE
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OPTICAL GAIN IMPROVEMENT OF GaAs LATERAL PHOTORESISTIVE ELEMENTS BY SULPHUR PASSIVATION OF THE SURFACE

机译:通过硫钝化光学增益改善GaAs横向光致抗蚀剂元件

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Enhancement of the performance of photoresistive elements has been demonstrated by applying sulphur surface passivation using Na_2S· 9H_2O water solution, mainly due to the decrease of the surface recombination current, resulting in an increase of the light sensitivity and switching rate. These results confirm the passivation of surface states through surface sulphur treatments. Further investigations using layer thicknesses comparable with the light absorption depth, are necessary and also smaller gaps between the contacts, and the changes in the speed of such devices are to be studied.
机译:通过使用NA_2S·9H_2O水溶液施加硫表面钝化来证明光致抗蚀元件性能的增强,主要是由于表面重组电流的降低,导致光敏性和切换率的增加。这些结果证实了通过表面硫处理的表面状态的钝化。使用与光吸收深度相当的层厚度的进一步调查是必要的,并且在触点之间也较小间隙,并且将研究这种装置的速度的变化。

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