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首页> 外文期刊>Physica Status Solidi. C, Conferences and critical reviews >Sulphur passivation of GaSb, InGaAsSb and AlGaAsSb surfaces
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Sulphur passivation of GaSb, InGaAsSb and AlGaAsSb surfaces

机译:GaSb,InGaAsSb和AlGaAsSb表面的硫钝化

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摘要

The effects of electrochemical treatment in either 21%(NH_4)_2S-H_2O or 16%Na_2S-C_3H_7OH solutions on the surface properties of GaSb, In_(0.23)Ga_(77)As_(0.18)Sb_(0.82) and Al_(0.34)Ga_(0.66)As_(0.025)Sb_(0.975) have been investigated by complementary use of Variable Angle Spectroscopic Ellipsometry (VASE) and X-ray Photoelectron Spectroscopy (XPS). We have shown that electrochemical sulphuration enables to produce 94-350 nm thick insulating overcoats with good surface morphology. The main components of the passivating layers are Ga_2S_3 and Sb_2S_5when formed on GaSb, while additional components of In_2S_3, admixture of Al_2O_3 and appearance of Al-As bond were observed on InGaAsSb and AlGaAsSb, respectively. The main feature distinguishing the effect of electrochemical treatment in Na_2S-C_3H_7OH when comparing to those in (NH_4)_2S-H_2O is that passivating layers contain additional components of Na_2SO_3 and/or Na_2SO_4.
机译:在21%(NH_4)_2S-H_2O或16%Na_2S-C_3H_7OH溶液中进行电化学处理对GaSb,In_(0.23)Ga_(77)As_(0.18)Sb_(0.82)和Al_(0.34)的表面性能的影响Ga_(0.66)As_(0.025)Sb_(0.975)已通过可变角度光谱椭圆仪(VASE)和X射线光电子能谱仪(XPS)的互补使用进行了研究。我们已经表明,电化学硫化能够产生具有良好表面形态的94-350 nm厚的绝缘外涂层。钝化层的主要成分是在GaSb上形成的Ga_2S_3和Sb_2S_5,而在InGaAsSb和AlGaAsSb上分别观察到In_2S_3的其他成分,Al_2O_3的混合和Al-As键的出现。与(NH_4)_2S-H_2O中的相比,区别于Na_2S-C_3H_7OH中的电化学处理效果的主要特征是钝化层包含Na_2SO_3和/或Na_2SO_4的其他组分。

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