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Models for predicting the index of refraction of compounds at 193 and 589-nm

机译:预测193和589-NM化合物折射率的模型

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A simple empirical model is presented that predicts the index of refraction at 589 nm (D-line) and 193 nm for molecules based solely on chemical structure. The model was built by comparing literature values of refractive indices (sodium D-line 589 nm) of compounds with representative functionalities and has 18 adjustable parameters. Published values for nD and n_(193) were used to extrapolate the predictions from values of nD to values of n_(193). These simple, accessible models can be run using only Excel software on a laptop computer.
机译:提出了一种简单的经验模型,其预测仅基于化学结构的分子为589nm(d-line)和193nm的折射率。 该模型是通过将化合物的折射率(D-589nm)的文献值与代表性功能进行比较,具有18个可调节参数来构建。 ND和N_(193)的已发布值用于将预测从ND的值推断到N_(193)的值。 这些简单的可访问型号可以仅在膝上型计算机上使用Excel软件运行。

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