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MONOMER COMPOUND INCLUDING A PHENYLTHIO GROUP, CAPABLE OF BEING USED FOR MANUFACTURING OPTICAL MATERIALS INCLUDING AN ORGANIC ANTI-REFLECTION COATING DUE TO HIGH REFRACTIVE INDEX AT 193 NM WAVELENGTH, A METHOD FOR MANUFACTURING THE SAME, AND THE ANTI-REFLECTIVE FILM INCLUDING THE SAME
MONOMER COMPOUND INCLUDING A PHENYLTHIO GROUP, CAPABLE OF BEING USED FOR MANUFACTURING OPTICAL MATERIALS INCLUDING AN ORGANIC ANTI-REFLECTION COATING DUE TO HIGH REFRACTIVE INDEX AT 193 NM WAVELENGTH, A METHOD FOR MANUFACTURING THE SAME, AND THE ANTI-REFLECTIVE FILM INCLUDING THE SAME
PURPOSE: A monomer compound including a phenlthio group is provided to obtain excellent optical absorbance power about a shortwave light source having a wavelength less than 193 nm excimer laser and to be used for manufacturing a linear polymer by including an acrylate group.;CONSTITUTION: A monomer compound is marked as a chemical formula 1. In the chemical formula 1, R1 is hydrogen or a methyl group and n is integer of 0-5. In the chemical formula 1, R2 and R3 are an alkyl group of C1-C5 or an alkoxy group of C1-C5. A method for manufacturing the monomer compound including a step of reacting a compound of a chemical formula 2 with a compound of a chemical formula 3 or a chemical formula 4 under the presence of base.;COPYRIGHT KIPO 2010
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