首页> 外国专利> MONOMER COMPOUND INCLUDING A PHENYLTHIO GROUP, CAPABLE OF BEING USED FOR MANUFACTURING OPTICAL MATERIALS INCLUDING AN ORGANIC ANTI-REFLECTION COATING DUE TO HIGH REFRACTIVE INDEX AT 193 NM WAVELENGTH, A METHOD FOR MANUFACTURING THE SAME, AND THE ANTI-REFLECTIVE FILM INCLUDING THE SAME

MONOMER COMPOUND INCLUDING A PHENYLTHIO GROUP, CAPABLE OF BEING USED FOR MANUFACTURING OPTICAL MATERIALS INCLUDING AN ORGANIC ANTI-REFLECTION COATING DUE TO HIGH REFRACTIVE INDEX AT 193 NM WAVELENGTH, A METHOD FOR MANUFACTURING THE SAME, AND THE ANTI-REFLECTIVE FILM INCLUDING THE SAME

机译:单体化合物,包括苯基基团,可用于制造光学材料,其中包括由于193 NM波长的高折射率而产生的有机抗反射涂层,一种制造相同的方法和相同的抗反射性的方法

摘要

PURPOSE: A monomer compound including a phenlthio group is provided to obtain excellent optical absorbance power about a shortwave light source having a wavelength less than 193 nm excimer laser and to be used for manufacturing a linear polymer by including an acrylate group.;CONSTITUTION: A monomer compound is marked as a chemical formula 1. In the chemical formula 1, R1 is hydrogen or a methyl group and n is integer of 0-5. In the chemical formula 1, R2 and R3 are an alkyl group of C1-C5 or an alkoxy group of C1-C5. A method for manufacturing the monomer compound including a step of reacting a compound of a chemical formula 2 with a compound of a chemical formula 3 or a chemical formula 4 under the presence of base.;COPYRIGHT KIPO 2010
机译:目的:提供一种具有苯硫基的单体化合物,以使其在波长小于193 nm的准分子激光的短波光源上获得优异的光吸收能力,并通过包含丙烯酸酯基用于制备线性聚合物。该单体化合物标记为化学式1。在化学式1中,R 1为氢或甲基,n为0-5的整数。在化学式1中,R 2和R 3为C 1 -C 5的烷基或C 1 -C 5的烷氧基。一种单体化合物的制造方法,包括在碱存在下使化学式2的化合物与化学式3或化学式4的化合物反应的步骤。COPYRIGHTKIPO 2010

著录项

  • 公开/公告号KR20100077453A

    专利类型

  • 公开/公告日2010-07-08

    原文格式PDF

  • 申请/专利权人 HYOSUNG CORPORATION;

    申请/专利号KR20080135385

  • 发明设计人 CHO IN SIK;KIM HYUNG JUN;SOH BYOUNG HWAN;

    申请日2008-12-29

  • 分类号C07C321/18;

  • 国家 KR

  • 入库时间 2022-08-21 18:32:17

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