t-Boc protected poly(p-hydroxystyrene-alt-carbon monoxide): a new class of deep-UV resists

摘要

An efficient synthetic route for the synthesis of t-Boc protected poly (p-hydroxy styrene-alt- carbon monoxide) utilizing a Pd(II) catalyst is reported. The polymer was deprotected by thermolysis or acidolysis of the tert-butoxycarbonyl protecting group to give the p- hydroxystyrene/CO copolymer. This material should lend itself well to lithographic applications because of our ability to control the molar mass of the material with a narrow molar mass distribution (which should lend to high development efficiencies). Preliminary lithographic evaluation of the copolymer is reported herein.