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High Voltage Photoconductive Switches using Semi-Insulating, Vanadium doped 6H-SiC

机译:高压光电导电开关使用半绝缘,钒掺杂6H-SIC

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摘要

SiC manufacturers are continually improving the purity of their wafers, however, interband impurities, while detrimental in many applications, can be useful in the operation of photoconductive switches. Compact, high-voltage photoconductive switches were fabricated using c-plane; vanadium doped 6H-SiC obtained from II-VI, Inc. This material incorporates a large amount of interband impurities that are compensated by the vanadium amphoteric, but at present is only available as c-plane wafers. In order to avoid micropipe defects, lateral switches were fabricated to allow validation of material simulations. Low resistivity contacts were formed on the semi-insulating material and a high-voltage encapsulant increases the surface flashover potential of the switch. Material characteristics were determined and switch parameters were simulated with comparisons made to experimental data.
机译:SIC制造商正在不断提高晶片的纯度,然而,在许多应用中有害的间带杂质可以在光电导电路的操作中有用。结构紧凑,使用C平面制造高压光电导电开关;从II-VI,Inc.获得的钒掺杂6H-SiC该材料包含大量的间带杂质,其由钒两性化补偿,但目前仅可用作C面晶片。为了避免微皮缺损,制造横向开关以允许验证材料模拟。在半绝缘材料上形成低电阻率触点,并且高压密封剂增加了开关的表面闪光灯电位。确定材料特性,并用对实验数据进行比较模拟开关参数。

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