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A 7-Nm Dual Port 8T SRAM with Duplicated Inter-Port Write Data to Mitigate Write Disturbance

机译:一个7-Nm双端口8T SRAM,具有重复的端口间写数据以减轻写干扰

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Two read-write 8T dual port static random accessmemories (SRAMs) suffer write disturb issue when both of its ports are accessed simultaneously. Write disturb is detrimental at low voltages in deep submicron technologies due to increased variations. This paper proposes a duplicated inter-port write data to mitigate write disturb in dual port SRAM design targeted on 7-nm FinFET TSMC technology. We have implemented duplicated inter-port write by employing two NMOS switches per bit line. We choose moderate sizes for these switches to have abalanced trade-off between area and duplication of inter-port write data. With NMOS switch size of nfin=4, we significantly suppress the write disturb and improve the write time by 2.16x at low voltage of 0.63V. Moreover, at further low voltages of 0.585V and 0.54V, our design achieves write time improvement over single port access.
机译:当两个端口同时访问时,两个读写8T双端口静态随机访问存储器(SRAM)会遇到写干扰问题。由于变化的增加,在深亚微米技术中,低电压下的写干扰是有害的。本文提出了一种重复的端口间写数据,以减轻针对7纳米FinFET TSMC技术的双端口SRAM设计中的写干扰。我们通过在每条位线上使用两个NMOS开关来实现端口间重复写入。我们为这些交换机选择适当的大小,以在面积和端口间写入数据的复制之间取得平衡。当NMOS开关尺寸为nfin = 4时,在0.63V的低压下,我们可以显着抑制写入干扰,并使写入时间缩短2.16倍。此外,在0.585V和0.54V的进一步低电压下,我们的设计可通过单端口访问实现写入时间的缩短。

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