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首页> 外文期刊>Circuits and Systems II: Express Briefs, IEEE Transactions on >A 45-nm Dual-Port SRAM Utilizing Write-Assist Cells Against Simultaneous Access Disturbances
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A 45-nm Dual-Port SRAM Utilizing Write-Assist Cells Against Simultaneous Access Disturbances

机译:利用针对同时访问干扰的写辅助单元的45 nm双端口SRAM

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Eight-transistor (8T) dual-port static random access memory (DP-SRAM) suffers from read and write disturbances at low voltages when both ports are accessed simultaneously, and write disturbance dominates the VDDmin in high-speed applications. This brief proposes a write-assist 8T (WA8T) cell to suppress the write disturbance for DP-SRAM to achieve a lower VDDmin with low area overhead and power consumption. We fabricated a 1-Mbit DP-SRAM with WA8T testchip using a 40-nm CMOS process. The proposed WA8T device achieved a 120-mV improvement in VDDmin with less than 1% area overhead.
机译:当同时访问两个端口时,八晶体管(8T)双端口静态随机存取存储器(DP-SRAM)在低压下会受到读写干扰,并且在高速应用中,写干扰占VDDmin的大部分。本简介提出了一种写辅助8T(WA8T)单元,以抑制DP-SRAM的写干扰,从而以较低的面积开销和功耗实现较低的VDDmin。我们使用40nm CMOS工艺制造了带有WA8T测试芯片的1Mbit DP-SRAM。拟议的WA8T器件在VDDmin方面实现了120 mV的改善,面积开销不到1%。

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