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Investigation of retention behavior for 3D charge trapping NAND flash memory by 2D self-consistent simulation

机译:通过2D自洽仿真研究3D电荷捕获NAND闪存的保留行为

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This paper presents a comprehensive investigation on retention behavior for three-dimensional charge trapping NAND flash memory by two-dimensional self-consistent simulation. Major physical mechanisms, including tunneling, charge trapping and de-trapping process as well as drift-diffusion have been incorporated into the simulator. The developed simulator is able to describe the charge transport along the bitline and in vertical direction in the memory structure. This work aims to help to design and optimize three-dimensional stackable CT-NAND architectures.
机译:本文通过二维自洽仿真对三维电荷陷阱NAND闪存的保留行为进行了全面的研究。包括隧穿,电荷陷阱和去陷阱过程以及漂移扩散在内的主要物理机制已被纳入模拟器。开发的仿真器能够描述沿位线和垂直方向在存储器结构中的电荷传输。这项工作旨在帮助设计和优化三维可堆叠CT-NAND架构。

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