首页> 外国专利> 3D NAND 3D SEMICIRCULAR VERTICAL NAND STRING WITH SELF ALIGNED FLOATING GATE OR CHARGE TRAP CELL MEMORY CELLS AND METHODS OF FABRICATING AND OPERATING THE SAME

3D NAND 3D SEMICIRCULAR VERTICAL NAND STRING WITH SELF ALIGNED FLOATING GATE OR CHARGE TRAP CELL MEMORY CELLS AND METHODS OF FABRICATING AND OPERATING THE SAME

机译:具有自对准浮动门或电荷陷阱细胞记忆细胞的3D NAND 3D半垂直垂直NAND线及其制造和操作方法

摘要

The memory device includes a plurality of memory cells arranged in a string substantially perpendicular to a major surface of the substrate 10 at a plurality of device levels, at least one first select gate located between a main surface of the substrate and a plurality of memory cells, A semiconductor channel (601) having an electrode, at least one second select gate electrode located over a plurality of memory cells, a portion extending vertically along a direction perpendicular to the main surface, a first A memory film 54, and a second memory film 54 in contact with the second side of the semiconductor channel. The second memory film is electrically isolated from the first memory film and positioned at the same level as the first memory film.
机译:该存储器件包括在多个器件级别上基本垂直于衬底10的主表面排列成一串的多个存储单元,至少一个第一选择栅极位于衬底的主表面和多个存储单元之间。半导体通道(601),其具有电极,位于多个存储单元上方的至少一个第二选择栅电极,沿垂直于主表面的方向垂直延伸的部分,第一A存储膜54和第二存储器薄膜54与半导体通道的第二侧接触。第二存储膜与第一存储膜电隔离并且位于与第一存储膜相同的水平。

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