Fabrication of Si Photonics Waveguides by Thick Resist-Mask Electron Beam Lithography Proximity Effect Correction

摘要

Silicon photonics has been an active research field in the last decade due to the potential of optoelectronics integration. Silicon photonics devices can be integrated within a CMOS compatible process to yield high performance Si chips that offer optical functionalities with reduced cost. Hence, it can be a promising candidate to exceed the speed bottleneck for data interconnects.