Method for determining parameters of proximity-function for correction of proximity-effects, during electron beam-lithography, involves representing periodic structure as patterns, during finding of parameter with Fourier-series-evolution

摘要

The method involves determining parameters of the proximity-function based on test patterns and measuring results from measurement of structures that are produced with the test patterns. A periodic structure is utilized as the test patterns and represented, during determination of a parameter with Fourier-series-evolution. The frequency modulated periodic structure exhibits parallel line with a breadth and distance that are varied according to frequency modulation. The proximity function represents a point spread function, which is formed by sum of two Gaussian-functions. An independent claim is also included for a computer program product that comprises program codes for implementing the method for determining the parameters of the proximity-function.