首页> 外文会议>Electronic Components and Technology Conference, 1991. Proceedings., 41st >Failure analysis of a hybrid device exhibiting copper dendritegrowth on thick film resistors
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Failure analysis of a hybrid device exhibiting copper dendritegrowth on thick film resistors

机译:具有铜枝晶的混合器件的失效分析厚膜电阻的增长

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The authors discuss the failure analysis performed on severalhybrid devices submitted to Oneida Research Services, Inc. The analysiswas initiated because of electrical testing failures-a voltage dividerexhibited an out-of-specification value during burn-in at elevatedtemperature. This voltage divider compared the outputs of two thick-filmresistors. Analysis of the hybrid failures revealed a copper dendriticgrowth propagating across the laser trims in the thick film resistor.The authors describe the hybrid materials construction, environmentaltesting, and electrical testing performed in examining the factors whichled to the dendrite growth and overall failure of the hybrids. Adetailed description of the analytical equipment and methodology used inidentifying the cause of the copper dendrite growth as a result ofprocessing is presented. The authors conclude with a discussion of thefailure analysis
机译:作者讨论了在几种情况下执行的故障分析 混合设备提交给Oneida Research Services,Inc.分析 因电气测试失败而启动-一个分压器 在高温老化过程中显示出不合规格的值 温度。该分压器比较了两个厚膜的输出 电阻器。对混合失效的分析显示出铜枝晶 厚膜电阻器中的激光微调传播生长。 作者描述了混合材料的构造,环境 测试,以及进行电气测试以检查哪些因素 导致枝晶生长和杂种的整体失败。一种 所用分析设备和方法的详细说明 确定由于以下原因导致铜枝晶生长的原因 介绍了处理过程。作者最后讨论了 故障分析

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