首页> 外文会议>Electronic Components and Technology Conference, 1991. Proceedings., 41st >Failure analysis of a hybrid device exhibiting copper dendrite growth on thick film resistors
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Failure analysis of a hybrid device exhibiting copper dendrite growth on thick film resistors

机译:混合器件在厚膜电阻器上显示出铜枝晶生长的故障分析

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The authors discuss the failure analysis performed on several hybrid devices submitted to Oneida Research Services, Inc. The analysis was initiated because of electrical testing failures-a voltage divider exhibited an out-of-specification value during burn-in at elevated temperature. This voltage divider compared the outputs of two thick-film resistors. Analysis of the hybrid failures revealed a copper dendritic growth propagating across the laser trims in the thick film resistor. The authors describe the hybrid materials construction, environmental testing, and electrical testing performed in examining the factors which led to the dendrite growth and overall failure of the hybrids. A detailed description of the analytical equipment and methodology used in identifying the cause of the copper dendrite growth as a result of processing is presented. The authors conclude with a discussion of the failure analysis.
机译:作者讨论了在提交给Oneida Research Services,Inc.的几种混合设备上执行的故障分析。该分析是由于电气测试故障而启动的-分压器在高温老化过程中显示出不合格的值。该分压器比较了两个厚膜电阻器的输出。对混合失效的分析表明,铜树突状生长在厚膜电阻器的激光微调中传播。作者描述了混合材料的构造,环境测试和电气测试,目的是检查导致杂化体枝晶生长和整体失效的因素。介绍了分析设备和方法的详细描述,该分析设备和方法用于确定加工导致的铜枝晶生长的原因。作者最后讨论了故障分析。

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