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An Analysis of Si-tube Based Double-Material Double Gate-All-Around (DMDGAA) MOSFETs

机译:基于硅管的双材料双栅全能(DMDGAA)MOSFET的分析

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In this paper, The gate-material engineering technique is used on double gate all around (DGAA) MOSFET. The gate material engineering technique has two dissimilar materials with dissimilar work functions. The different materials have combined to make a single gate MOSFET. The silicon-tube double-gate-all-around MOSFET have two gates. There are one gate (inner gate) inside of silicon-tube and one gate (outer gate) outside of silicon-tube. ATLAS device simulation based comparative study of double material double gate all around (DMDGAA) and double gate all around (DGAA) Junction based MOSFETs have been performed. The simulation results express that this modification of MOSFET enhanced the ON-OFF current (ION/IOFF) ratio, greatly reduce the OFF current (IOFF). The introduced modification also improves short channel effects (SCEs) compared to DGAA MOSFET. DMDGAA MOSFET provides high-speed and ultra-low power operation for Ultra large-scale integration (ULSI) applications.
机译:本文将栅极材料工程技术用于双栅极全能(DGAA)MOSFET。浇口材料工程技术具有两种具有不同功函数的不同材料。不同的材料结合在一起制成了一个单栅极MOSFET。硅管双栅极全能MOSFET具有两个栅极。硅管内部有一个门(内门),硅管外部有一个门(外门)。基于ATLAS器件仿真的双材料双栅极全能(DMDGAA)和双栅极全能(DGAA)结型MOSFET的比较研究已经完成。仿真结果表明,对MOSFET的这种修改增强了ON-OFF电流(I 打开 /一世 关闭 )比率,大大降低了OFF电流(I 关闭 )。与DGAA MOSFET相比,引入的修改还改善了短沟道效应(SCE)。 DMDGAA MOSFET可为超大规模集成(ULSI)应用提供高速和超低功耗运行。

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