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Subthreshold current reference suitable for energy harvesting: 20ppm/C and 0.1/V at 140nW

机译:亚阈值电流基准适合能量收集:140nW时为20ppm / C和0.1%/ V

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A new CMOS ultra low power, resistor free, current reference is presented which is composed of two current generators, a current scalar, and a current subtraction circuit. Typical reference topologies generally add two current signals with opposing temperature coefficient (TC) polarities to generate a near zero TC reference current (Ir). The proposed circuit generates two currents (Ia and Ib) with the same polarity TCs that are scaled with differing slopes, and subsequently ratioed and subtracted from each other to form an Ir. In each current generator, the amplifier's built-in offset voltages track thermal voltages (VT) that are forced across resistive MOSFETs, contained in self-cascodes (SC), to make Ia and Ib. The magnitudes of Ia and Ib are adjusted semi independently from their TCs via MOSFET's aspect ratios. Also by setting MOSFET aspect ratios, the current scalar and subtraction circuit deducts the adjusted Ia and Ib from one another to form an Ir optimized for near zero TC. All generated currents are independent of MOSFET's threshold voltage (VTH) and primarily a function of MOSFET's mobility (u) and thermal voltage (VT), thus aiding performance to specifications over changes in temperature and fabrication process variations. Simulations, including montecarlo (MC) and worst case (WC), indicates the following specifications are achievable: current consumption (Idd) ~ 150nA, TC ~ 20 ppm/C, Voltage Coefficient (VC) ~ 0.1 %/V, power supply rejection ratio (PSRR) ~ -65 db, and power-up time (tsu) ~ 14 milliseconds. Preliminary die size is about 101 micro meter (um) per side.
机译:提出了一种新的CMOS超低功耗,无电阻电流基准,该基准由两个电流发生器,一个电流标量和一个电流减法电路组成。典型的参考拓扑通常会添加两个具有相反温度系数(TC)极性的电流信号,以产生接近零的TC参考电流(Ir)。所提出的电路产生两个具有相同极性TCs的电流(Ia和Ib),并以不同的斜率进行缩放,然后彼此成比例和相减以形成Ir。在每个电流发生器中,放大器的内置失调电压跟踪热电压(VT),该电压被压在自级联(SC)中的电阻MOSFET上,从而形成Ia和Ib。 Ia和Ib的大小可通过MOSFET的纵横比与TC进行半独立调节。同样,通过设置MOSFET的宽高比,电流标量和减法电路会相互减去调整后的Ia和Ib,以形成针对接近零TC进行优化的Ir。所有产生的电流都与MOSFET的阈值电压(VTH)无关,并且主要是MOSFET的迁移率(u)和热电压(VT)的函数,因此有助于在温度变化和制造工艺变化时提高性能指标。包括蒙特卡罗(MC)和最坏情况(WC)在内的仿真表明可以实现以下规格:电流消耗(Idd)〜150nA,TC〜20 ppm / C,电压系数(VC)〜0.1%/ V,电源抑制比率(PSRR)〜-65 db,上电时间(tsu)〜14毫秒。模具的初步尺寸为每侧约101微米(um)。

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