首页> 外文会议>International Conference on Simulation of Semiconductor Processes and Devices >Full-quantum study of AlGaN/GaN HEMTs with InAlN back-barrier
【24h】

Full-quantum study of AlGaN/GaN HEMTs with InAlN back-barrier

机译:具有InAlN背势垒的AlGaN / GaN HEMT的全量子研究

获取原文
获取外文期刊封面目录资料

摘要

A full-quantum simulation of the electron transport in the two-dimensional electron gas (2DEG) of a AlGaN/GaN/InAlN/GaN heterostructure is carried out using the non-equilibrium Green function (NEGF) approach. The introduction of the InAlN back-barrier and the use of a ultra-thin GaN layer for the charge transport considerably entangles the physics of the device. A full-quantum approach is then deemed necessary to shed light on the transport properties of these devices. Gate-length and channel-thickness scaling are studied to assess the impact of confinement effects on the elctrostatic integrity of the device.
机译:使用非平衡格林函数(NEGF)方法对AlGaN / GaN / InAlN / GaN异质结构的二维电子气(2DEG)中的电子传输进行了全量子模拟。 InAlN背势垒的引入以及超薄GaN层在电荷传输中的使用,极大地纠缠了器件的物理性能。因此,认为有必要采用全量子方法来阐明这些器件的传输特性。研究了栅极长度和沟道厚度的缩放比例,以评估限制效应对器件静电稳定性的影响。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号