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PNP Transistor Design Simulation in SiGe BiCMOS with Low Cost High Performance

机译:低成本,高性能的SiGe BiCMOS PNP晶体管设计与仿真

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摘要

The study and design of a low cost and high performance vertical PNP transistor at BiCMOS process platform is presented. The effect of different device designs on baseline process has been compared in terms of their electrics characteristics simulation result. The performance of PNP has been improved further through process optimization with the aid of process simulation. The fabricated PNP transistor silicon data shows consistent performance with simulation. Finally the performance of PNP device has met the target including current gain above 38, breakdown voltage (BV_(CEO)) over 7 volts and cut-off frequency (f_T) 10GHz. Its performance addresses the requirement for high speed circuit design.
机译:提出了一种在BiCMOS工艺平台上进行低成本,高性能的垂直PNP晶体管的研究与设计。就其电气特性仿真结果而言,已比较了不同器件设计对基准工艺的影响。通过工艺优化,通过工艺优化进一步提高了PNP的性能。所制造的PNP晶体管硅数据显示出与仿真一致的性能。最终,PNP器件的性能达到了目标,包括高于38伏的电流增益,超过7伏的击穿电压(BV_(CEO))和10GHz的截止频率(f_T)。它的性能满足了高速电路设计的要求。

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