Effects of Diffent Inhibitors on Cu-Co Galvanic Corrosion in Post CMP Cleaning

摘要

The large potential difference between copper and cobalt caused the corrosion of copper and cobalt films and the galvanic corrosion in the process of chemical mechanical planarization (CMP) and post cleaning of cobalt barrier layer. In this paper, the effects of different inhibitors on the inhibition of copper-cobalt galvanic corrosion in the cleaning solution are studied. Different concentrations of inhibitors were added to FA/O II chelating agent as cleaning agent. The inhibition effect was characterized by electrochemical workstation and the cleaning effect of particles was tested by SEM. The results show that the corrosion potential difference of Cu and Co and surface roughness can be significantly reduced with different concentration of inhibitors.