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Method and apparatus for suppressing the effects of galvanic corrosion in the single-wafer wafer cleaning system
Method and apparatus for suppressing the effects of galvanic corrosion in the single-wafer wafer cleaning system
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机译:抑制单晶片晶圆清洗系统中电化腐蚀影响的方法和设备
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摘要
A method for minimizing galvanic corrosion effects in a single-wafer cleaning system is provided. The method initiates with spraying a cleaning chemistry containing corrosion inhibitors onto a surface of a wafer. Then, the surface of the wafer is exposed to the cleaning chemistry for a period of time. Next, a concentration gradient at an interface of the cleaning chemistry and the surface of the wafer is refreshed. Then, a rinsing agent and a drying agent are applied simultaneously to remove the cleaning chemistry, wherein the drying agent dries the surface of the wafer prior to a concentration of the corrosion inhibitors being diluted to a level insufficient to provide corrosion protection.
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