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Thick Beryllium Coatings by Magnetron Sputtering

机译:磁控溅射厚铍涂层

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Thick (>150 μm) beryllium coatings are studied as an ablator material of interest for fusion fuel capsules for the National Ignition Facility (NIF). As an added complication, the coatings are deposited on mm-scale spherical substrates, as opposed to flats. DC magnetron sputtering is used because of the relative controllability of the processing temperature and energy of the deposits. We used ultra small angle x-ray spectroscopy (USAXS) to characterize the void fraction and distribution along the spherical surface. We investigated the void structure using a combination focused ion beam (FIB) and scanning electron microscope (SEM), along with transmission electron microscopy (TEM). Our results show a few volume percent of voids and a typical void diameter of less than two hundred nanometers. Understanding how the stresses in the deposited material develop with thickness is important so that we can minimize film cracking and delamination. To that end, an in-situ multiple optical beam stress sensor (MOSS) was used to measure the stress behavior of thick Beryllium coatings on flat substrates as the material was being deposited. We will show how the film stress saturates with thickness and changes with pressure.
机译:研究了厚(> 150μm)的铍涂层作为国家点火装置(NIF)的聚变燃料胶囊感兴趣的烧蚀材料。更为复杂的是,涂层是沉积在毫米级的球形基板上,而不是平坦的。由于处理温度和沉积物能量的相对可控性,因此使用直流磁控溅射。我们使用超小角度X射线光谱(USAXS)来表征空隙率和沿球面的分布。我们使用聚焦离子束(FIB)和扫描电子显微镜(SEM)结合透射电子显微镜(TEM)研究了空隙结构。我们的结果显示出少量的空隙,典型的空隙直径小于200纳米。了解沉积材料中的应力如何随厚度变化是很重要的,这样我们才能最大程度地减少薄膜开裂和分层。为此,当沉积材料时,使用原位多光束应力传感器(MOSS)来测量平坦基板上厚铍涂层的应力行为。我们将展示膜应力如何随厚度饱和并随压力变化。

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