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机译:离子辅助磁控溅射法制备的厚铍涂层
General Atomics, San Diego, California 92186-5608;
Materials Science and Technology , Lawrence Livermore National Laboratory, Livermore, California 94550;
Department of Engineering, Brown University, Providence, Rhode Island 02912;
Materials Science and Technology , Lawrence Livermore National Laboratory, Livermore, California 94550;
General Atomics, San Diego, California 92186-5608;
Materials Science and Technology , Lawrence Livermore National Laboratory, Livermore, California 94550;
General Atomics, San Diego, California 92186-5608;
General Atomics, San Diego, California 92186-5608;
General Atomics, San Diego, California 92186-5608;
Materials Science and Technology , Lawrence Livermore National Laboratory, Livermore, California 94550;
Materials Science and Technology , Lawrence Livermore National Laboratory, Livermore, California 94550;
General Atomics, San Diego, California 92186-5608;
General Atomics, San Diego, California 92186-5608;
General Atomics, San Diego, California 92186-5608;
机译:通过磁控溅射制备的厚CR涂层的微观结构和高温蒸汽氧化特性,用于事故耐燃料包层:偏差在沉积过程中的作用
机译:直流磁控溅射(DCMS)产生的厚Ta(N)涂层的化学计量和摩擦学行为
机译:直流磁控溅射厚α-TA涂层的制备和热冲击性能(DCMS)
机译:磁控溅射厚铍涂层
机译:溅射靶腐蚀及其对长时间直流磁控溅射镀膜的影响
机译:磁控溅射沉积的ZrZr氮化物和Zr-碳氮化物涂层的合成微观结构表征及纳米抑制
机译:磁控溅射厚铍涂层