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Effect of oxygen partial pressure on the electrical properties of the LSCO/AZO heterojunction

机译:氧分压对LSCO / AZO异质结电性能的影响

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P-type La0.5Sr0.5CoO3 (LSCO) and n-type 0.3 wt% Al-doped ZnO (AZO) thin films were obtained by radio-frequency magnetron sputter under different controlled Ar/O2 atmosphere. The structure of the heterojunction was p-LSCO (~125 and 250 nm)-AZO (~300 and 600 nm)/Si wafer and show good rectifying behavior.
机译:P型La 0.5 Sr 0.5 CoO 3 (LSCO)和n型0.3重量%的Al掺杂ZnO(AZO)薄膜在不同的Ar / O 2 受控气氛下,通过射频磁控溅射法获得。异质结的结构为p-LSCO(〜125和250 nm)/ n-AZO(〜300和600 nm)/ Si晶片,并显示出良好的整流性能。

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