首页> 外文会议>Nanoelectronics Conference (INEC), 2010 >Direct growth of Bismuth Telluride nanowires by On-Film Formation of Nanowires for high-efficiency thermoelectric devices
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Direct growth of Bismuth Telluride nanowires by On-Film Formation of Nanowires for high-efficiency thermoelectric devices

机译:通过薄膜形成高效率热电器件的纳米线直接生长碲化铋纳米线

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We report a novel stress-induced method to grow single crystalline Bi2Te3 nanowires, On Film Formation of Nanowires (OFF-ON), their growth mechanism and transport properties. Single crystalline Bi2Te3 nanowires were found to grow on as-sputter ed BiTe films after thermal annealing at 350°C. This growth was facilitated by stress relaxation between the film and the thermally oxidized Si substrate originating from a mismatch of the thermal expansion. The mechanism for wire growth is stress-induced mass flow along grain boundaries in the polycrystalline film.
机译:我们报道了一种新颖的应力诱导方法,用于生长单晶Bi 2 Te 3 纳米线,纳米线的成膜(OFF-ON),它们的生长机理和传输特性。在350℃下进行热退火后,发现单晶Bi 2 Te 3 纳米线在溅射的BiTe薄膜上生长。由于热膨胀的不匹配,膜和热氧化的硅衬底之间的应力松弛促进了这种生长。导线生长的机制是应力诱导的多晶膜中沿晶界的质量流。

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