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Equivalent circuit model for thermal resistance of deep trench isolated bipolar transistors

机译:深沟槽隔离双极型晶体管热阻的等效电路模型

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An equivalent circuit model for thermal resistance of deep trench isolated bipolar transistors on conventional SOI and compound buried layer (CBL) substrates has been proposed to investigate the thermal resistance behaviour in a 3×3 array of similar devices. The model is based on 3D electro-thermal simulations with realistic boundary conditions for increased accuracy. The simulations and circuit model show an excellent agreement with the measurements. Results suggest that a separation in the range 2 to 4 µm between two adjacent devices in an array would be sufficient to limit the rise in thermal resistance due to thermal coupling.
机译:为了研究类似器件的3×3阵列中的热阻行为,提出了一种等效的电路模型,用于研究传统SOI和复合掩埋层(CBL)衬底上的深沟槽隔离双极型晶体管的热阻。该模型基于具有逼真的边界条件的3D电热仿真,以提高准确性。仿真和电路模型与测量结果显示出极好的一致性。结果表明,阵列中两个相邻器件之间的2到4 µm的间距足以限制由于热耦合而引起的热阻上升。

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