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1200 V 4H-SiC BJTs with a Common Emitter Current Gain of 60 and Low On-resistance

机译:1200 V 4H-SiC BJT,具有60的共同发射极电流增益和低导通电阻

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This paper reports a 4H-SiC bipolar junction transistor (BJT) with a breakdown voltage (BV_(CEO)) of 1200 V, a maximum current gain (β) of 60 and the low on-resistance (R_(sp_on))of 5.2 mΩcm~2. The high gain is attributed to an improved surface passivation SiO_2 layer which was grown in N_2O ambient in a diffusion furnace. The SiC BJTs with passivation oxide grown in N_2O ambient show less emitter size dependence than reference SiC BJTs, with conventional SiO_2 passivation, due to a reduced surface recombination current. SiC BJT devices with an active area of 1.8 mm × 1.8 mm showed a current gain of 53 in pulsed mode and a forward voltage drop of V_(CE)=2V at I_C=15 A (J_C=460 A/cm~2).
机译:本文报道了一种4H-SiC双极结型晶体管(BJT),其击穿电压(BV_(CEO))为1200 V,最大电流增益(β)为60,低导通电阻(R_(sp_on))为5.2 mΩ·cm〜2。高增益归因于改进的表面钝化SiO_2层,该层在扩散炉中的N_2O环境中生长。在N_2O环境中生长的具有钝化氧化物的SiC BJT与常规SiO_2钝化相比,具有比参考SiC BJT更低的发射极尺寸依赖性,这是因为其表面复合电流降低。有源区为1.8 mm×1.8 mm的SiC BJT器件在I_C = 15 A(J_C = 460 A / cm〜2)时,脉冲模式下的电流增益为53,正向压降为V_(CE)= 2V。

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