RIM-13: A high-resolution imaging tool for aerial image monitoring of patterned and blank EUV reticles

摘要

Key features of the RIM-13 EUV actinic reticle imaging microscope are summarised. This tool generates aerial images from blank or patterned EUV masks, emulating the illumination and projection optics of an exposure tool. Such images of mask defects, acquired by a CCD camera, are analysed using the tool software to predict their printability on resist exposure in an EUVL exposure tool. Optical, mechanical and software performance of the tool are reported.