Reduced features two-dimensional photonic crystals on InP-based materials etched using Cl/sub 2//Ar inductively coupled plasma

摘要

We have fabricated two-dimensional InP-based photonic crystal structures using Cl/sub 2//Ar inductively coupled plasma etching. Etched depth of 2.8 /spl mu/m is obtained for 240 nm hole diameter with a nearly vertical shape. With this recipe, we are able to etch small features, as small as 110 nm, down to 1.9 /spl mu/m. Optical qualification shows 80 dB/cm propagation losses in W3 InP/InGaAsP/InP photonic crystal waveguide.