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Effects of gate-insulator nitridation gas on MISiC Schottky-diode hydrogen sensors

机译:栅极绝缘子氮化气体对MISiC肖特基二极管氢传感器的影响

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MISiC Schottky-diode hydrogen sensors with gate insulator grown in three different nitridation gases (NO, N2O and NH3) are fabricated. Steady-state and transientresponse measurements are carried out at different temperatures and hydrogen concentrations using a computer-controlled measurement system. Experimental results show that these nitrided sensors have high sensitivity and can give a rapid and stable response over a wide range of temperature. The study also finds that N2O provides the fastest insulator growth with good insulator quality, and hence the highest sensitivity among the three nitrided samples. The N2O-nitrided sensor can give significant response even at a low H2concentration of 48-ppm H2in N2, indicating potential applications for detecting hydrogen leakage at high temperature. The response times of the three nitrided samples are also shorter than that of the control sample. At 300°C, the response time of the N2O-nitrided sample to 48-ppm H2in N2is ll s, while that of the control sample is 65 s.
机译:制作了具有在三种不同氮化气体(NO,N 2 O和NH 3 )中生长的栅绝缘体的MISiC肖特基二极管氢传感器。使用计算机控制的测量系统,可以在不同的温度和氢气浓度下进行稳态和瞬态响应测量。实验结果表明,这些氮化传感器具有很高的灵敏度,并且可以在很宽的温度范围内提供快速,稳定的响应。研究还发现,N 2 O提供了最快的绝缘子生长和良好的绝缘子质量,因此在三个氮化样品中灵敏度最高。即使在N 中H 2 的浓度低至48-ppm H 2 的情况下,N 2 O氮化传感器也可以给出显着的响应2 ,表明在高温下检测氢气泄漏的潜在应用。三个氮化样品的响应时间也比对照样品的响应时间短。在300°C下,N 2 O氮化样品对N 2 中48ppm H 2 的响应时间为ll s,对照样品的时间为65 s。

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