Comparison of InGaP-with AlGaAs-gated Low Noise PHEMTs by Current-Dependent Hot-Electron Stresses

摘要

A newly proposed method, called the current-dependent hot-electron stresses, is used to study InGaP-gated and AlGaAs-gated low noise PHEMT devices with different drain currents at high drain voltage. The impact ionization between gate and drain is major mechanism affecting devices during hot-electron stressing, which are excited by the high gate-to-drain electric field. However, the measure of the effects of impact ionization related to the drain current, during the hot-electron stressing, is less discussed in the published literatures. In this work, the designed hot-electron stressed conditions, which are related to the different drain currents are used to demonstrate the influence of drain currents in hot-electron stresses and, furthermore, to estimate and compare InGaP-gated with AlGaAs-gated PHEMTs.