high electron mobility transistors; doping profiles; ion implantation; carrier mobility; silicon; elemental semiconductors; Ge-Si alloys; semiconductor materials; laterally-scaled MODFET; in situ p-well doping; ion-implanted p-well doping; vertical scaling; halo doping; 2D channel dopant incorporation; mobility degradation; buried p-well doping; undoped channel region; subthreshold behavior; self-gain; speed-power product; Si-SiGe;
机译:离子注入埋入p阱掺杂改善了Si / SiGe n-MODFET中的DC和RF性能
机译:通过原位掺杂选择性Cvd外延生长形成具有嵌入Sige源极/漏极的高Ge组分本征Sige-异质沟道Mosfets
机译:结合原位HCl HCl蚀刻和原位掺杂外延SiGe重生长的超浅结的新技术
机译:具有原位和离子植入的P阱掺杂的横向缩放的Si / SiGe n-Modfet
机译:调制掺杂的Si / SiGe量子阱结构的传输性质。
机译:用于热电应用的高掺杂n型SiGe晶体的压敏液相外延
机译:气源分子束外延技术原位掺杂控制n-p-n Si / SiGe / Si异质结双极晶体管的生长