Fabrication of Step and Flash~(TM) Imprint Lithography Templates Using Commercial Mask Processes

摘要

This article presents the results of a collaborative effort between Molecular Imprints, Inc. (MII) and Photronics, Inc. to develop a baseline process for fabricating Step and Flash Imprint Lithography (S-FIL~(TM)) templates that are compatible with lithography tools being developed by MIL S-FIL is a replication technique with sub-50nm resolution capability that has the potential to lead to a low cost, high throughput process. Template fabrication results and S-FIL patterning results on 200mm wafers are presented.