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The surfactant effects of antimony on the formation of InAsSb nanostructures on GaAs by metal-organic chemical vapor deposition

机译:锑的表面活性剂对金属有机化学气相沉积在GaAs上形成InAsSb纳米结构的影响

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We have investigated InAsSb nanostructures formed on GaAs during MOCVD. The transition thickness from 2D growth to 3D growth is reduced by the addition of TMSb/Sb_4. This is consistent with both an increase in the adatom diffusion length and a reduction in the epilayer/vapor surface energy attributed TMSb/Sb_4.
机译:我们已经研究了在MOCVD期间在GaAs上形成的InAsSb纳米结构。通过添加TMSb / Sb_4,可以减少从2D生长到3D生长的过渡厚度。这与增加的原子扩散长度和归因于TMSb / Sb_4的外延层/蒸汽表面能的降低是一致的。

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